专利名称：CERAMIC SUBSTRATE, METHOD OF
MANUFACTURING CERAMIC SUBSTRATE,AND METHOD OF MANUFACTURINGPOWER MODULE SUBSTRATE
发明人：Hiroshi Tonomura,Takeshi Kitahara,Hiroya
Ishizuka,Yoshirou Kuromitsu,YoshiyukiNagatomo
申请号：US13867439申请日：20130422
公开号：US20130232783A1公开日：20130912
专利附图：
摘要：Disclosed is a ceramic substrate including silicon in which the concentration of asilicon oxide and a silicon composite oxide in the surface thereof is less than or equal to2.7 Atom %.
申请人：MITSUBISHI MATERIALS CORPORATION
地址：Tokyo JP
国籍：JP
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