专利名称：Method of drying wafers发明人：Wen-Chang Kuo,Szu-Yao Wang申请号：US10036887申请日：20020104公开号：US06598314B1公开日：20030729
专利附图：
摘要：A new method and apparatus is provided for the cleaning and drying of a wafer.An IPA vapor is created using an ultrasonic nebulizer that can be operated at a relativelylow temperature. The water and the IPA that is used by the cleaning and drying processwill be heated and evaporated using energy supplied by a microwave source of energy.
申请人：TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY
代理人：George O. Saile,Stephen B. Ackerman
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容